Reactive Ion Etcher(RIE)

time:2016-05-17Hits:7设置

Instrument name

Reactive Ion Etcher (RIE)

Model

Plasmalab 80plus RIE

Manufacturer

Oxford Instruments

Specifications

1.Etching Materials: Si, SiO2, Si3N4

2.Sample Size: Maximum Size 200 mm

3.RF Power: Frequency 13.56 MHZ, Power Adjust Range is 0-600 W

4. Gas Supply: include CF4CHF3, SF6N2HeO2, Ar etc.

5.Control System: PC+PLC Control


Applications and Uses

Reactive ion etching (RIE) machine is mostly used in the field of fabrication of micro/nano device. Our RIE instrument could etched Si, SiO2 and Si3N4.

Accessories

Dry Pump

Contact: Mingfa Peng

Tel.: 65883196

E-mailmfpeng@suda.edu.cn























                                          Editor: Mingfa Peng

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