Atomic Layer Deposition System (ALD)
Cambridge Nano Tech
2.Sample Size: Up to 4”
3.Deposition Temperature: The maximum temperature is ～300 ℃
4. Carrier Gas: N2, MFC control is 10-1000 sccm.
Applications and Uses
Atomic Layer Deposition System (ALD) is a self-limiting process capable of precise monolayer growth, which is mainly used for the dielectric layer thin film deposition in the field of nano field-effect transistor (FET) and organic light emitting diode (OLED).
Contact: Mingfa Peng
Editor: Mingfa Peng