Mask Aligner

time:2016-05-17Hits:16设置

Instrument name

Mask Aligner

Model

MJB4

Manufacturer

SUSS Micro Tec Lithography GmbH

Specifications

Substrate Size4” * 4” (100 mm) diameter substrate

Substrate thickness: Up to 4 mm diameter

Mask Size: from 2” * 2” to 5” * 5”

Light Source: 500 W mercury lamp

Support Constant Light Intensity or Constant Power Mode

Resolution: Soft Contact Mode could realize 2 um structure

                   Hard Contact Mode could realize 1 um structure

                   Vacuum Contact Mode could realize 0.5 um structure


Applications and Uses

The machine is exclusively intended for use as an alignment and /or exposure device for substrates used in semiconductor and micro system technology.

Accessories

Damping workbench

ContactMingfa Peng

Tel.: 65883196

E-mailmfpeng@suda.edu.cn

























                                             Editor: Mingfa Peng

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