KURT J.LESKER COMPANY
1.There are three sputtering targets with 2 diameter,
and one of them could sputter ferro magnetic material.
2.Power Supply: RF and DC Power Supply
3.Shutter: There are 3 source shutter and 1 substrate
4.Ultimate Vacuum: 5*10-5 Pa; Work Background Vacuum: 7*10-4 Pa；
5.Platen Size: Up to 4 diameter
6.Heating: ≤500 ℃
7.System Control: PC+PLC Control
Applications and Uses
Magnetron sputter is a universal metal coating machine, used for depositing of single-layer or multi-layer metal film. It could be mainly used for the metal, semiconductor, oxide et. al. electrodes preparation in the field of nano-device and organic photoelectric device.
Contact: Mingfa Peng
Editor: Mingfa Peng